PLASMA TREATMENT APPARATUS

摘要

PURPOSE: To increase the treatment number of substrates per a unit time by enhancing the use efficiency of a treatment chamber, to eliminate the effect of the positional irregularity of a plurality of non-treated substrates within a cassette on the treatment quality of the substrates and to prevent the generation of a particle caused by the rubbing of the substrates with the cassette due to the positional shift of the substrates at the time of the insertion of the treated substrates in the cassette. CONSTITUTION: A rotary table 10 on which a plurality of cassettes C are placed is provided and an alignment table 16 having a plurality of guide pins 40 implanted in the upper surface thereof so as to be arranged corresponding to the outer peripheral shape of a substrate is arranged and a substrate transfer mechanism 14 having two substrate transferring arms 26, 32 is provided.