发明名称 Process gas distribution system and method
摘要 Gas flow control units in cabinet are connected to distribute process gas, on demand, to a plurality of utilization locations known as "tool" locations in a semi-conductor manufacturing plant. The flow control units are adapted to deliver process gas selectively from one of two supply tanks to any one or all of four different tool locations. Simple, fast, low-cost purging of the gas delivery conduits is provided to facilitate maintenance, gas cylinder changes, etc. Means are provided to enable pulse purging of the long gas delivery conduit from the cabinet to the tool when flow-through or other purging is not possible.
申请公布号 US5497316(A) 申请公布日期 1996.03.05
申请号 US19950416511 申请日期 1995.04.04
申请人 SCI SYSTEMS, INC. 发明人 SIERK, DENNIS A.;DUROSS, RONALD R.;GEIST, STEPHEN G.;HAYES, GREGORY L.
分类号 F17C13/02;F17C13/04;H01L21/00;(IPC1-7):G05B11/01;G06F15/00 主分类号 F17C13/02
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