发明名称 DIAZO COMPOUND, PHOTOSENSITIVE LITHOGRAPHIC PRINTING MATRIX USING THE SAME AND METHOD FOR DEVELOPING THE PRINTING MATRIX
摘要 PURPOSE: To obtain a diazo compound useful for e.g. photosensitive lithographic printing matrices high in plate wear, free from print stain, excellent in developability and having wide pH latitude. CONSTITUTION: This diazo compound is such that an aromatic secondary amino compound having group of formula I (X is a counter anion of diazonium) has been added in a ring-opened fashion to the oxirane ring of a polyfunctional epoxy compound (e.g. bisphenol A digiycidyl ether). This compound is obtained, for example, by the following process: a ring-opening addition reaction is made between (A) a polyfunctional epoxy compound and (B) an aromatic secondary amino compound having substituent (pref. acylamido, nitro) convertible into amino group, and the substituent convertible into amino group on the reaction product is converted into amino group which is, in turn, converted into diazonium salt. Alternatively, this compound can also be obtained by polyaddition reaction between a diisocyanate compound and a diol of formula II (R<1> and R<2> are each a single bond or alkylene).
申请公布号 JPH0859589(A) 申请公布日期 1996.03.05
申请号 JP19940214312 申请日期 1994.08.17
申请人 KONICA CORP;MITSUBISHI CHEM CORP 发明人 KONUMA TOMOHITO;MATSUMURA TOMOYUKI;OTA TOMOHISA;MURATA MASAHISA;TSUJI SHIGEO
分类号 G03F7/016;C07C245/20;G03F7/00;G03F7/021;G03F7/30;(IPC1-7):C07C245/20 主分类号 G03F7/016
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