| 摘要 |
<p>Disclosed is a product of vapor deposition comprising a vapor deposited thin film formed on a surface of an organic substrate through an intermediate agent which includes at least a silicone resin and silicon dioxide, and a method of manufacturing a product of vapor deposition, in which the silicon dioxide is produced by plasma treatment. Accordingly, the vapor deposited thin film is significantly improved in an adhesive strength to provide the product of vapor deposition with an excellent washing resistance and abrasion resistance.</p> |
