发明名称 APPARATUS AND METHOD FOR MAKING METAL OXIDE SPUTTERING TARGETS
摘要 An apparatus and process for making metal oxide sputtering targets from volatile and thermally unstable metal oxide powder (11) by hotpressing the metal oxide powder (11) in a graphite die assembly (12) having a ceramic barrier sleeve (24) disposed therein to isolate the metal oxide powder (11) from the graphite die assembly (12) components. To avoid the drawbacks of retaining vapors and gases in the powdered target material during hot-pressing, a gas release device is disposed within the die cavity (19) to minimize the amount of trapped vapor and gas. Heat treating said powdered target starting material prior to loading said material into said die cavity to partially reduce said powder also reduces the amount of vapor and gas retained in the powdered target material during hot-pressing.
申请公布号 WO9606201(A1) 申请公布日期 1996.02.29
申请号 WO1994US13398 申请日期 1994.11.22
申请人 MATERIALS RESEARCH CORPORATION 发明人 LO, CHI-FUNG;TURN, JOHN
分类号 C04B35/645;C23C14/34;(IPC1-7):C23C14/34;B22F3/14 主分类号 C04B35/645
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