A method of producing a semiconductor integrated circuit device,申请号HK19960000279-传众专利搜索

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发明名称	A method of producing a semiconductor integrated circuit device
摘要
申请公布号	HK27996(A)	申请公布日期	1996.02.23
申请号	HK19960000279	申请日期	1996.02.15
申请人	HITACHI LTD	发明人	KOUSUKE OKUYAMA
分类号	H01L21/8246;H01L27/112;(IPC1-7):H01L27/10;H01L21/82	主分类号	H01L21/8246
代理机构		代理人
主权项
地址

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