发明名称 Ceramic composition for circuit substrat and its fabrication
摘要 <p>The present invention provides ceramic circuit substrate which is sintered at 900 to 1,050 DEG C and have low relative dielectric constant, thermal expansion coefficient comparable to that of silicon, and high bending strength, and a method of manufacturing the same. A glass is employed as row material, of which softening point is 850 to 1,100 DEG C, that is, a glass having a composition included in an area in Fig. 1 (triangular composition diagram of SiO2-B2O3-R2O, a composition is represented by the position of a small circle, the number in a small circle represents the composition number) defined with lines connecting points representing the first, third, tenth, eleventh, and fourth compositions respectively. <MATH></p>
申请公布号 EP0697725(A2) 申请公布日期 1996.02.21
申请号 EP19950111855 申请日期 1995.07.27
申请人 HITACHI, LTD. 发明人 TANEI, HIRAYOSHI;IWANAGA, SHOICHI;OKAMOTO, MASAHIDE;NAKAMURA, MASATO;MORITA, KOUSAKU;ISHIHARA, SHOUSAKU;KOBAYASHI, FUMIYUKI;TAGAMI, FUMIKAZU;SENGOKU, NORIO;FUJITA, TSUYOSHI
分类号 C03C3/089;C03C8/16;C03C14/00;C03C17/06;H01L21/48;H01L23/15;H05K1/03;(IPC1-7):H01L23/15 主分类号 C03C3/089
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