| 摘要 |
PURPOSE:To stably and homogeneously produce a dielectric thin film by depositing a perovskite-structure double oxide compd. on a substrate heated by a substrate heater and periodically heating the surface of the coating film with another heat source. CONSTITUTION:Plural substrates 2 of MgO, etc., are set on a soaking plate 4 as a substrate holder of P-BN, etc., provided with a heater 1 in a reaction chamber contg. an oxygen atmosphere, a raw material target 3 is magnetron- sputtered to deposit a perovskite-structure double oxide compd,. coating film consisting of ABO3(A is Pb Ba, Sr or La, and B is Ti or Zr) on the substrates kept at a specified temp., and a dielectric thin film is obtained. An additional heating sheet 5 is arranged between the substrate 2 and target 3 in addition to the heater 1 to periodically heat the coating film from the surface side. As a result, a stage wherein the sputtered particles flying to the substrate are deposited and a stage for improving and stabilizing the crystallinity by the additional heating are repeated. |
