发明名称 |
HEAT STABILITY COMPOSITION |
摘要 |
<p>PURPOSE: To provide a new intermediate body compound that can be applied to a semiconductor precursor by the spin-on technique, shows improved flatness and gap-filling characteristics, and enables a composition after curing to withstand a temperature exceeding a specific temperature. CONSTITUTION: A composition is made of perylene anhydride and aminosilane and contains perylene diimide and alkyl poly (silsesquioxane). The composition can be used as a mask or mandrel that is useful in a process in an IC- manufacturing process, especially a process being exposed to a temperature exceeding 500 deg.C and can be eliminated by such means as a known CF4 /O2 RIE and chemical/mechanical polishing.</p> |
申请公布号 |
JPH0851102(A) |
申请公布日期 |
1996.02.20 |
申请号 |
JP19950126893 |
申请日期 |
1995.05.25 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
HARORUDO JIYOOJI RINDO;ROOZUMARII AN PUREBUITEI KERII;TOMASU JIYOOZEFU RIIN |
分类号 |
C08L83/06;C08G73/10;C08G77/54;C08L83/02;C09D183/14;H01L21/302;H01L21/3065;H01L21/312;(IPC1-7):H01L21/312;H01L21/306 |
主分类号 |
C08L83/06 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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