| 摘要 |
<p>PURPOSE:To produce a liquid crystal display for which an MIM element having a series structure is used as a switching element by reducing application times of photolithography. CONSTITUTION:In this production method of a liquid crystal display device, a pixel display electrode 11 and a lower layer 21B of a lower electrode layer 21 are formed, and an upper layer 21T of the lower electrode 21 and wiring for anodic oxidation connected to the upper layer 21T are formed on the lower layer 21B. The surface of the upper layer 21T is oxidized to form an insulating film 22. Then a wiring electrode 10, upper electrode 23b connected to the pixel display electrode 11 over the insulating film, and upper electrode 23a connected to the wiring electrode 10 are formed. Thereafter, by removing the wiring for anodic oxidation and the insulating film formed thereon, the nonlinear resistance element, wiring electrode 10 and pixel display electrode 11 are formed on the one substrate.</p> |
