发明名称 Method for treating an oxidized copper film
摘要 The present invention is directed to an improved method for treating an oxidized surface of a copper film for bonding to a resinous layer such as in the formation of a single-sided, double-sided, or multi-layered circuit board and to a layered product produced by the method. In particular, the method of the present invention comprises the steps of: contacting the oxidized surface of a copper film, having cupric oxide whiskers protruding therefrom, with an acidic reducing solution having a pH of 1 to 6.5 and having an effective amount of a water soluble thiosulfate reducing agent dissolved therein to provide a reduced copper surface; and rinsing the reduced copper surface with an acidic solution to produce a rinsed and reduced copper surface having reduced whiskers protruding therefrom, said reduced whiskers each being a mix of cuprous oxide and metallic copper. Preferably, the reduced surface is treated with a passivating agent to minimize any reoxidation prior to laminate formation.
申请公布号 US5492595(A) 申请公布日期 1996.02.20
申请号 US19940226017 申请日期 1994.04.11
申请人 ELECTROCHEMICALS, INC. 发明人 CARANO, MICHAEL V.;HARRYHILL, THERESE M.
分类号 C23C22/63;C23C22/83;H05K3/38;H05K3/46;(IPC1-7):B44C1/22;C23F1/00 主分类号 C23C22/63
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