发明名称 |
SOI TRANSISTOR WITH SELF-MATCHING BASE BODY CONTACT AND ITS PREPARATION |
摘要 |
PURPOSE: To form a body contact without requiring penetration through a source, as required by conventional technology, while minimizing increase of the area by fabricating an SOI transistor having a self-aligned body contact passing through the extension to a gate. CONSTITUTION: An initial opening is defined by protruding a source 116 and a drain 114 and a conformal layer 120 is formed thereon. It is then etched to form side walls defining an aperture and a contact aperture is etched using these side walls to define a side wall supporting member for supporting an insulation side wall thus isolating a collector electrode from the gate, source and drain.
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申请公布号 |
JPH0851208(A) |
申请公布日期 |
1996.02.20 |
申请号 |
JP19950162653 |
申请日期 |
1995.06.28 |
申请人 |
INTERNATL BUSINESS MACH CORP <IBM> |
发明人 |
KURAUSU DEIITORIHI BAIYAA;TAKI NASERU BUUTEI;CHIYAN MIN SHIE;RUI RU CHIEN SHIYUU |
分类号 |
H01L21/336;H01L29/786;(IPC1-7):H01L29/786 |
主分类号 |
H01L21/336 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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