发明名称 SOI TRANSISTOR WITH SELF-MATCHING BASE BODY CONTACT AND ITS PREPARATION
摘要 PURPOSE: To form a body contact without requiring penetration through a source, as required by conventional technology, while minimizing increase of the area by fabricating an SOI transistor having a self-aligned body contact passing through the extension to a gate. CONSTITUTION: An initial opening is defined by protruding a source 116 and a drain 114 and a conformal layer 120 is formed thereon. It is then etched to form side walls defining an aperture and a contact aperture is etched using these side walls to define a side wall supporting member for supporting an insulation side wall thus isolating a collector electrode from the gate, source and drain.
申请公布号 JPH0851208(A) 申请公布日期 1996.02.20
申请号 JP19950162653 申请日期 1995.06.28
申请人 INTERNATL BUSINESS MACH CORP <IBM> 发明人 KURAUSU DEIITORIHI BAIYAA;TAKI NASERU BUUTEI;CHIYAN MIN SHIE;RUI RU CHIEN SHIYUU
分类号 H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 H01L21/336
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