发明名称 Test analysis apparatus and analysis method for semiconductor wafer using OBIC analysis
摘要 A test analysis apparatus for OBIC analysis and luminous analysis from a rear surface of a semiconductor wafer. According to the present invention, a semiconductor wafer is mounted on a wafer chuck and a probe card which has metallic needles and which is movable along the X, Y, and Z axes supplies a test pulse signal to respective electrode pads on the front surface of the semiconductor wafer. Then, current generated in the semiconductor wafer is detected at the electrode pads. Optical analysis, such as irradiation with a light beam, detection of reflected light, detection of light generated in the semiconductor wafer and the like, is performed from the rear side of the semiconductor wafer, thereby enabling analysis of a failure or a defect of a defective portion while the semiconductor wafer is in actual operating conditions.
申请公布号 US5493236(A) 申请公布日期 1996.02.20
申请号 US19940264718 申请日期 1994.06.23
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 ISHII, TATSUYA;MIYAMOTO, KAZUTOSHI
分类号 H01L21/66;G01R31/265;G01R31/311;(IPC1-7):G01R31/00 主分类号 H01L21/66
代理机构 代理人
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