发明名称 |
PRODUCTION OF MASK FOR PHOTOLITHOGRAPHY |
摘要 |
<p>PURPOSE:To decrease the device cost and to improve the resolution by forming a transparent conductive thin film on a mask substrate and giving electric conductivity thereto. CONSTITUTION:A mask substrate 1 and a electrode 2 for working are dipped in an electrolytic soln. 5 which fills a chamber 7. The mask substrate 1 and the electrode 2 are electrically connected to a current/voltage controlling device 4. The electrode 2 has at least one sharp tip and is wholly covered with an insulating material except the sharp tip. The electrode 2 is held by a stage 3 which can precisely and three-dimensionally move to a desired positions on the mask substrate 1. The stage 3 is controlled by a controlling device 6 for positioning. Voltage is applied between the mask substrate 1 and the electrode 2 so as to precipitate a material having light-shielding property such as metal on the mask substrate 1 or to dissolve a material having light-shielding property on the mask substrate 1.</p> |
申请公布号 |
JPH0850349(A) |
申请公布日期 |
1996.02.20 |
申请号 |
JP19940186101 |
申请日期 |
1994.08.08 |
申请人 |
SEIKO INSTR INC |
发明人 |
SUDA MASAYUKI;ANDOU AKIHITO;ATAKA TATSUAKI |
分类号 |
B81C99/00;C23F1/00;C25D5/02;G03F1/54;G03F1/68;(IPC1-7):G03F1/08 |
主分类号 |
B81C99/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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