| 摘要 |
<p>PURPOSE:To make the sheet resistance of the film to be formed on an insulating substrate in an initial stage almost equal to the sheet resistance of films to be formed on the substrate after the initial stage in a sputtering device. CONSTITUTION:In this array substrate for a liquid crystal display device, films for address wiring, data wiring, data electrode 9, pixel electrode 7, and thin film transistor 11 are formed on an insulating substrate 1. When films are formed on the insulating substrate 1 by a sputtering device, the electric power to be applied to the sputtering device is changed in two stages of the initial stage and the succeeding stage. In the initial stage of film forming, the electric power suitable to form a film having a specified sheet resistance on the insulating substrate 1 is applied to the sputtering device. Also, in the succeeding stage after the initial stage, the electric power suitable to form films having specified sheet resistance on the insulating substrate is applied to the sputtering device.</p> |
