发明名称 METHOD FOR INSPECTING PATTERN
摘要 PURPOSE:To reduce erroneous detections by obtaining a binary flag image from comparison result between an image to be inspected separated from a first image including a plurality of patterns and a preliminarily stored reference image, and comparing a binary element image with a preliminarily stored reference element image. CONSTITUTION:A first processing part 10 reads out and stores data of an address where a flag of data memory of a storing/processing part 11 is esterblished, reference data in inspection mode. The processing part 10 compares data of an image to be inspected cut from a sliding window memory 8 sequentially with the stored reference image data, and outputs binary abnormal flag data as the comparison result to an abnormal flag-selecting device 12 in synchronization with the cutting of the image from the memory 8. An abnormal flag input to the device 12 is input to a frame buffer memory 13 synchronously with the cutting of the image from the memory 8. A second processing part 15 sequentially converts flag image data from the memory 13 into element data, thereby to judge the presence/absence of a defect.
申请公布号 JPH0843050(A) 申请公布日期 1996.02.16
申请号 JP19940193709 申请日期 1994.07.26
申请人 NIKON CORP 发明人 KASHIMA TAKUZOU
分类号 G01B11/24;G01N21/88;G06T1/00;G06T7/00 主分类号 G01B11/24
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