| 摘要 |
PURPOSE:To provide a transmittance modulation type photomask which is easily producible while having the performance equivalent to the performance of the conventional photomasks and a process for production thereof and an optical element formed by using the same. CONSTITUTION:A light absorption layer 3 having absorptivity to light of a prescribed wavelength region is formed on at least one surface of a substrate 2 for the photomask which is substantially plane on both surfaces and is substantially transparent to light of the prescribed wavelength region. This light absorption layer 3 is formed to a shape having a prescribed depth distribution. As a result, the transmittance of light is given according to the depth distribution when the light of the prescribed wavelength region is transmitted through this layer. The transmittance of the light is higher at the points where the depth is deeper and the transmittance of the light is lower at the points where the depth is shallower and, therefore, this photomask acts as the transmittance modulation type photomask 1. The photomask is more easily producible than the photomask formed with the prescribed shape on the substrate itself for the photomask. |
