| 摘要 |
<p>PURPOSE:To enhance the dimensional accuracy and the resolution of a pattern in a baking device. CONSTITUTION:In a gas replacement tank 12, a baking tank 13 and a substrate cooling tank 14, thermal insulation covers 25, 31, 55, 61 covering the periphery of hot plates 21, 51 and the periphery of a semiconductor substrate 81 are formed of partition walls 56, 62 having vacuum layers 57, 63 in the inner part. The temperature of the semiconductor substrate 81 exposed to light for pattern formation after resist is applied is controlled so as to be a fixed temperature in the gas replacement tank 12. After that, the semiconductor substrate 81 is placed on the hot plate 51 with a built-in heater 53 in the baking tank 13 and baked at a fixed temperature and after that, it is quickly cooled down to a room temperature.</p> |
