| 摘要 |
<p>PURPOSE:To prevent a substrate fracture, and provide an image display device using a good electron emission element by thermally treating an organic metal thin film at temperature equal to or above a level for forming a metallic oxide out of organic metal. CONSTITUTION:After a substrate 1 is sufficiently washed by use of a detergent, distilled water and an organic solvent, an element electrode material is stacked using the vapor deposition method, the sputter method or the like. Then, element electrodes 4 and 5 are formed on the substrate 1, using the photo-lithograph technology. Thereafter, organic metal solution is applied to the substrate 1 with the electrodes 4 and 5 laid and shelved, thereby communicating the electrodes 4 and 5 to each other and forming an organic metal thin film. Also, heating temperature at a plurality of coating and heating processes for the organic metal solution is set at a level equal to or higher than the melting temperature of organic metal, but equal to or lower than the thermal decomposition temperature. The organic metal thin film is thereby formed. This thin film is further heated and baked at temperature equal to or above the thermal decomposition temperature for the organic metal, thereby forming a metallic or metallic oxide thin film.</p> |
