METHOD OF MANUFACTURING PHASE SHIFT MASK

摘要

The method for manufacturing a mask being used in light exposure process, comprises the steps of: (i) forming a phase shift layer on a transparent substrate; (ii) defining a main pattern region by forming an interlayer insulation film on the phase shift layer and photoetching the interlayer insulation film; (iii) forming an irregularity layer on entire surface of the phase shift layer; and (iv) forming a supplement pattern region having a number of projections by etching the phase shift layer using the irregularity layer as mask.