发明名称 Apparatus for evaluating characteristics of semiconductor device and method of evaluating characteristics of semiconductor device using the same
摘要 A probe is attached to a support plate vertically to the surface of the support plate. A drop of a molten metal is formed at a tip portion of the probe. The support plate has a heater for setting the temperature of the probe and the drop of the molten metal at the tip portion of the probe. The probe is situated at a position corresponding to a position of an electrode of an LSI. The probe is connected to a measuring device for evaluating characteristics of the LSI by wiring. The drop of the molten metal connects the probe and the electrode of the LSI electrically.
申请公布号 US5491425(A) 申请公布日期 1996.02.13
申请号 US19940215774 申请日期 1994.03.22
申请人 KABUSHIKI KAISHA TOSHIBA 发明人 WATANABE, TORU;YONEKURA, YURI;OKUMURA, KATSUYA
分类号 G01R1/073;G01R1/067;G01R31/26;H01L21/66;(IPC1-7):G01R1/06 主分类号 G01R1/073
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