| 摘要 |
PURPOSE:To provide a polishing composition which can increase the polishing speed and delay the deterioration of the polishing agent in the scratch-free mirror surface polish. CONSTITUTION:This polishing composition comprises 2-30 pts.wt. of a polishing material of 0.1-10mum average particle diameter and 1-20 pts.wt. of at least one selected from the group consisting of alkyl sulfate salts and polyoxyethylene monofatty acid esters. The substrate is polished on its surface, as the buff having the polishing composition adhered on its surface is rotated. |
