<p>Enhanced fidelity of pattern transfer of aqueous developable photoresist compositions is achieved with top antirefective coatings which are fluorine-containing and have a refractive index approximately equal to the square root of the underlying photoresist and which are removable in the developer for the photoresist.</p>
申请公布号
KR960002241(B1)
申请公布日期
1996.02.13
申请号
KR19920011400
申请日期
1992.06.25
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION
发明人
BRUNSVOLD, WILLIAM R.;HEFFERON, GEORGE J.;LYONS, CHRISTOPHER F.;MOREAU, WAYNE M.;WOOD, ROBERT L.
