| 摘要 |
PURPOSE:To effectively process a photoresist at a high speed by initially closing a filter, opening a shutter to irradiate through the filter, then closing the shutter, opening the filter during as predetermined pause period, and again opening the shutter to irradiate without the filter. CONSTITUTION:When a shutter 24 is initially opened, a filter 3 is closed. When the light irradiates through the filter 3, the intensity of the irradiated light of an exposure photosensitive wavelength on the photoresist surface is small, gas is slowly generated in a suppressed state, and drained through a thin surface film. Then, the shutter 24 is closed. This period is a pause period, and the gas generated in this period is completely removed. The shutter 24 is opened again in the state that the filter 3 is opened but since the gas is not fed through the filter 3, the intensity of the irradiated light on the photoresist surface is large to process it in a short time. Since the gas is completely removed, even if the irradiated light of large intensity is processed, the photoresist film is not damaged. |
