Cleaning method for semiconductor wafer processing apparatus,申请号EP19900116275-传众专利搜索

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发明名称	Cleaning method for semiconductor wafer processing apparatus
摘要
申请公布号	EP0416400(B1)	申请公布日期	1996.02.07
申请号	EP19900116275	申请日期	1990.08.24
申请人	APPLIED MATERIALS INC.	发明人	NAGASHIMA, MAKOTO;KOBAYASHI, NAOAKI;WONG, JERRY
分类号	C23C16/44;C23G5/00;H01L21/00;(IPC1-7):C23C16/44;B08B7/00;H01L21/285	主分类号	C23C16/44
代理机构		代理人
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