ACTIVE MATRIX SUBSTRATE AND ITS PRODUCTION

摘要

PURPOSE:To decrease photoresist stages. CONSTITUTION:Transparent conductive films 2 and first metallic films 3 are formed on a magnetic glass substrate 1 and are patterned to form gate electrodes 4 and pixel electrodes 5. A gate insulating film 6 and a non-doped a-Si film 7 are formed and this Si film 7 is patterned to an island form. A channel protective film 8 is formed and the channel protective film 8 on the electrode taking out regions of the Si film 7 are selectively removed. The gate insulating film 6 on pixel electrodes 5 and peripheral contact parts 9 are removed. An n<+> type a-Si film 10 and a second metallic film 11 are formed and are patterned to form drain electrodes 12 and source electrodes 13. A passivation film 15 is formed and is patterned.