| 摘要 |
PURPOSE:To perform optical shaping at high speed with high accuracy by performing the exposure of a pattern region by the repetition of partial exposure almost equally dispersed over the whole of the pattern region. CONSTITUTION:Parallel light LO passes through only the part corresponding to an article 3 to be shaped of a pattern mask 11 to expose a photo-setting resin 1. A control signal CM is applied to a sub-mask driving part 14 from a central control part 27 simultaneously with the application of the control signal CM. Whereupon, the sub-mask driving part 14 holds a sub-mask 13 at a position LP1 only for a time DELTAt1. Subsequently, when the time DELTAt1 is elapsed, the sub-mask driving part 14 moves the sub-mask 13 in the direction shown by an arrow uP to set the same to a position LP2 and holds the sub-mask at the position LP2 only for a time DELTAt2. As mentioned above, the exposure of the photo-setting resin 1 to parallel light LO through a slice pattern P and the pattern mask 11 is not performed at once but performed over two times. |
