PHOTOMASK, ITS PRODUCTION AND PRODUCTION OF SEMICONDUCTOR INTEGRATED CIRCUIT DEVICE USING THE PHOTOMASK

摘要

PURPOSE:To improve the transfer accuracy of a phase-shifting photomask. CONSTITUTION:A deviation checking pattern 5 consisting of a first pattern 5a made of the same material as a light-shielding pattern and a second pattern 5b formed with the same material as a phase-shifting pattern is arranged in the vicinity of the actual pattern region of a glass substrate. The space (DELTAs) between the first pattern 5a and the second pattern 5b is made smaller than the resolution of an exposure light, and the pattern of the space between the first pattern 5a and the second pattern 5b is not transferred on a semiconductor wafer.