Process and device for the continuous treatment of silicon

摘要

PCT No. PCT/DE92/00526 Sec. 371 Date Jan. 3, 1994 Sec. 102(e) Date Jan. 3, 1994 PCT Filed Jun. 26, 1992 PCT Pub. No. WO93/01131 PCT Pub. Date Jan. 21, 1993.The invention relates to a process for the continuous treatment of silicon in which a slag in a pivotable low-shaft furnace (1) with a discharge pipe (4) reaching the bottom of the furnace tank is taken to a temperature of 1450 DEG to 1800 DEG C. and this slag is used to melt solid silicon and/or liquid silicon is continuously refined and the liquid refined silicon is then sprayed with compressed air or nitrogen (7) and continuously conveyed into a transport crucible (11) by being poured into a stream of water (9) in the channel (8) via a dewatering filter (10) and thus obtained in granular form. The invention also relates to devices for implementing the process.