| 摘要 |
PURPOSE:To obtain a light-shielding film having enough low reflectance in a visible ray region by forming a layer structure of chromium oxide film/ chromium nitride film from a transparent substrate side. CONSTITUTION:On a glass substrate 1, a chromium oxide film 2, chromium nitride film 3 and metallic chromium film 4 are formed and patterned by photolithography. Or, a chromium oxide film 2 and a chromium nitride film 3 are formed on a glass substrate 1 and patterned by photolithography. Or, a chromium oxide film and a chromium oxide nitride film 5 are formed on a glass substrate and patterned by photolithography. In this case, another layer (film) may be formed between the metallic chromium film 4 and the chromium nitride film 3, because the metallic chromium film 3 is essentially used to improve the light-shielding property. |
