| 摘要 |
PURPOSE:To provide the positive type photosensitive composition, which can prevent the halation without hindering sensitivity, resolution and residual film ratio. CONSTITUTION:This positive type resist composition includes alkali soluble phenol resin (a), kynondiazidosulfonic acid ester photosensitive agent (b) and the compound (c) having dibenzilydenaceton framework. In the formula I, R<1>-R<2> mean the substitutional group different from each other and expressed with the formula II (in the formula II, R<5>-R<9> mean hydrogen atom, halogen atom, hydroxyl group, alkyl group, aryl group, alkenyl group, alkinyl group, amino group, nitro group, cyano group, alkoxy group and acetyl group, and one of them means the hydroxyl group, and they can be the same one or they can be different from each other). R<3>-R<4> mean hydrogen atom, alkyl group, alkenyl group and aryl group, and they can be the same one or they can be different from each other. |
