| 摘要 |
PURPOSE:To obtain a color filter without having a black matrix but equipped with an alignment mark having a good shape of the mark which does not cause errors in alignment when cells are formed by laminating a pattern of the mark shape on a base pattern. CONSTITUTION:A red resist is applied to the whole surface of a glass substrate 1 by spin coating, exposed through a photomask and developed. In this process, the photomask for red color (a plate for red) is provided with a pattern for a color alignment mark 2 and a pattern for a square or circular base pattern 4 which is a little larger than the alignment mark 3 necessary to assemble a TFT device. Then a green resist is used to form a pattern of a plate for green. Further, a blue resist is used to form a pattern of a plate for blue. In this process, the plate for blue is provided with the pattern for the mark 3 in such a manner that the mark 3 is laminated on the base pattern 4. |
