Inductively coupled plasma reactors

摘要

The disclosure relates to a plasma reactor in which capacitive coupling and RF power dissipation is advantageously reduced by employing an RF coil (12) having plural coil sections (12a,12b,12c), each coil section connected across an RF source (22), commonly tapped ones of the coil sections being wound in opposite directions. Capacitive coupling and RF power dissipation is further reduced by employing a top lid (24) having an outer insulating annulus (26) and an inner conducting disk portion (28), the conducting disk portion being displaced or spaced apart from the coil by the width of the annulus. This displacement significantly reduces the RF power dissipation or coupling from the top winding of the coil to the lid. Furthermore, the plural coil sections or mirror coil configuration reduces sputtering of insulative material induced by capacitive RF coupling. <MATH>