| 摘要 |
A method for the exposure of photo-sensitive material to be exposed (1) is performed inside of a casing (2) sealed against light from an external light source. The material to be exposed (1) is placed in a circular arc-shaped plane (3) having a uniform distance to a center longitudinal axis (4). Laser light beams (10), derived from the laser beam (6) of a laser generator (5) and deflected with a rotatable mirror (9), are providing exposure spots on the material to be exposed (1) with point-shaped signals. The recording speed is doubled or, respectively, an image or text composition is processed in half the time previously required by deflecting the light beams (10), exiting in parallel to an axis from the collimator (8), onto at least two mirror faces (12a and 12b), disposed at an angle (11) relative to the center median axis (4). Thereupon, the reflected parallel light beams (20) are focused in an optical system (13) and the light beams (15, 16) are then directed radially onto the focusing plane (14) of the rotary and circulating surface (1a) of the material to be exposed (1).
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