| 摘要 |
PURPOSE:To reduce consumption of developing solution and board contamination due to developing solution mist while the developing solution is loaded, by quickly supplying the developing solution over the whole surface of a board and loading the solution. CONSTITUTION:A board W is retained with a spin chuck 1 so as to horizontally rotate around the rotation centor CP. A nozzle 5 for supplying developing solution is arranged at a discharging position above the board W. In a developing solution-spreading process, a diffusion member 8 is retained with a diffusion member displacement mechanism 9, in the direction which intersects the rotating direction of the board W, and at the processing position isolated by a very small interval (d) from the surface of the board W. Developing solution discharged from the nozzle 5 to the board W is spread with the diffusion member 8 and loaded, while the board W is horizontally rotated at a low speed around the rotation centor CP. |
