发明名称 |
Inspection method and apparatus for inspecting a particle, if any, on a substrate having a pattern |
摘要 |
Disclosed is an inspection method and apparatus: wherein (i) first light having a first state of polarization and a first wavelength, and (ii) second light having a second state of polarization, different from the first state of polarization, and a second wavelength, different from the first wavelength are produced; at least the first light is projected to a position of inspection; and heterodyne interference light produced on the basis of the second light and light scattered at the inspection position and having its state of polarization changed, by the scattering, from the first state of polarization, is detected.
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申请公布号 |
US5486919(A) |
申请公布日期 |
1996.01.23 |
申请号 |
US19930076951 |
申请日期 |
1993.06.15 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
TSUJI, TOSHIHIKO;TAKEUCHI, SEIJI;MIYAZAKI, KYOICHI;YOSHII, MINORU;NOSE, NORIYUKI;MORI, TETSUZO |
分类号 |
G01J9/02;G01J9/04;G01N21/88;G01N21/94;G03F7/20;(IPC1-7):G01B9/02 |
主分类号 |
G01J9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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