发明名称 Method of manufacturing a semiconductor component, in particular a buried ridge laser
摘要 In the method, a doped semiconductor coating is to be deposited on a disturbed surface (S) of a semiconductor base (9) doped with a dopant having the same conductivity type as the coating. According to the invention, prior to depositing a main layer (28) of the coating (10), a superdoped layer (24) is deposited, which superdoped layer has a dopant concentration that is greater than twice the mean concentration of the coating. The invention applies in particular to manufacturing a semiconductor laser for an optical fiber telecommunications system.
申请公布号 US5486489(A) 申请公布日期 1996.01.23
申请号 US19940191165 申请日期 1994.02.03
申请人 ALCATEL N.V. 发明人 GOLDSTEIN, LEON;BONNEVIE, DOMINIQUE
分类号 G02B6/13;H01L21/20;H01L33/00;H01S5/00;H01S5/227;H01S5/30;(IPC1-7):H01L21/20 主分类号 G02B6/13
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