| 摘要 |
PURPOSE:To obtain different refractive indices without changing radiating amts. of electron beams when polymer optical waveguides are produced by electron beam drawing method by providing a production device for polymer optical waveguide with a mechanism to introduce gas into a drawing room where a sample is patterned with electron beams. CONSTITUTION:A gas is introduced by using a variable leak valves and the sample is irradiated with electron beams in this atmosphere. However, the gas causes contamination in the electro-optical system of an electron gun and decreases the life of the filament of the electron gun. Therefore, a differential evacuating system is inserted between an electron beam irradiating room and the electro-optical system to improve the vacuum degree in the electron gun system. After a polyimide soln. or polyamide acid soln. is applied on a substrate such as silicon by spin coating, the coating film is heated to remove the solvent, and if necessary, the film is cured to obtain a polyimide film. Then, the substrate is introduced into the device to produce a polymer optical waveguide. The device is first evacuated to be vacuum, into which proper gas is introduced till a specified pressure is obtd. In this atmosphere, the film is irradiated with electron beams to obtain specified refractive index to obtain the optical waveguide. |
