发明名称 POSITIVE PHOTOSENSITIVE COMPOSITION
摘要 PURPOSE:To obtain a compsn. having high sensitivity, high resolution and good profile without deposition with time by using at least one kind of specified compds. for a low mol.wt. compd. which is decomposed with acid and suppresses dissolution. CONSTITUTION:This positive photosensitive compsn. contains a resin which is insoluble with water and soluble with an aq. alkali soln. and contains a structural unit expressed by formula I and a structural unit expressed by formula II, a compd. which produces acid by irradiation of active rays or radiation, and a low mol.wt. compd. which is decomposed with acid and suppresses dissolution. This low mol.wt. compd. has the mol.wt. of <=3000 and tertiary alkylester groups and shows an increase of solubility in an aq. alkali soln. by the effect of acid. In this positive photosensitive compsn., the compd. to suppress dissolution is selected from compds. having at least two tertiary alkylester groups in such a manner that in the distance between the farthest ester groups, 10 or more atoms excluding the ester groups are bonded. In formulae I and II, R01-R04 are hydrogen atoms or the like and m and n are 0 or integers 1 to 3.
申请公布号 JPH0815862(A) 申请公布日期 1996.01.19
申请号 JP19940152218 申请日期 1994.07.04
申请人 FUJI PHOTO FILM CO LTD 发明人 AOSO TOSHIAKI;YAMANAKA TSUKASA
分类号 G03F7/004;G03F7/039;H01L21/027;(IPC1-7):G03F7/039 主分类号 G03F7/004
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