| 摘要 |
PURPOSE:To prevent a bad influence to a base unit so as to improve a yield rate in manufacture by using a specific material in a masking film, used in the case of molding a metal oxide film in a prescribed position, and enlarging thickness of the film by a dip coating method, so as to facilitate removing and separating after molding. CONSTITUTION:A cylindrical base unit 1 is dip painted in slurry containing mixed powder of 5mum or more mean grain size of compound oxide powder containing stabilized zirconia, La, Ma, to form a masking film 6 of 30 to 100mm thickness. Next, a waterproofing tape 5 is removed, and after coating with a prescribed metal oxide film 3, the masking film 6 is removed to obtain the base unit of a cell. Here is formed the masking film 6 of porous quality, and by a small contact area with the base unit 1, reaction with the base unit 1 is decreased, to faciltate separating and removing. In the case of molding the metal oxide film 3, by increasing thickness of the film, infiltrating halogenated gas is suppressed, and etching the base unit can be prevented. |
