| 摘要 |
PURPOSE: To provide a method for washing a vacuum chamber rapidly and inexpensively by reducing time to the down time of a device and a simplified, strong lid for the vacuum chamber. CONSTITUTION: A pretreatment including a process for spraying beads for roughening the surface of a replaceable part for a vacuum chamber including a single body machining aluminum lid 12, a crystal door 16, and a crystal shield 18 is performed. As a result, the amount of adhered materials being deposited on the surface of the part can be increased while the semiconductor substrate is being machined, thus reducing the amount of time before reaching the down time of a device. Also, since the aluminum lid 12 is machined in single body, it is simplified and is strong and at the same time does not require any disassembly and assembly operations on washing.
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