发明名称 MANUFACTURE OF FILM TRANSISTOR, AND FILM TRANSISTOR AND LIQUID CRYSTAL DISPLAY
摘要 <p>PURPOSE:To provide the manufacture of a high-quality TFT having favorable property. CONSTITUTION:In the manufacture of a film transistor, which grows and stacks the gate insulating layer 3 and the semiconductor layer 4 of a film transistor by plasma CVD method, when growing and stacking the semiconductor layer on the gate insulating layer, the interval between discharge electrodes is changed, with the plasma discharge maintained, after growing the gate insulating layer, and then the semiconductor layer is grown.</p>
申请公布号 JPH0818063(A) 申请公布日期 1996.01.19
申请号 JP19950076403 申请日期 1995.03.31
申请人 TOSHIBA CORP 发明人 KASHIRO TAKESHI
分类号 G02F1/136;G02F1/1368;H01L21/205;H01L21/336;H01L29/786;(IPC1-7):H01L29/786 主分类号 G02F1/136
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