发明名称 |
PLASMA RECOMBINATION X-RAY LASER ALIGNER |
摘要 |
PURPOSE:To provide a plasma recombination X-ray laser aligner by which a minute pattern can be transferred by using soft X-ray and which is small and low-cost. CONSTITUTION:A plasma recombination X-ray laser aligner is constituted in such a way that a pulse-train laser is shone at a laser oscillator 1 and amplifiers 2, 3 from an excitation laser-irradiation mechanism 4 and that a plasma recombination X-ray laser which has been oscillated and amplified by the laser oscillator 1 and the amplifiers 2, 3 is shone at a semiconductor wafer 5 on a wafer stage 6 via an exposure pattern 7a so as to perform an exposure operation. |
申请公布号 |
JPH0817701(A) |
申请公布日期 |
1996.01.19 |
申请号 |
JP19940143632 |
申请日期 |
1994.06.24 |
申请人 |
RIKAGAKU KENKYUSHO |
发明人 |
HARA TAMIO;ANDO KOZO;AOYANAGI KATSUNOBU |
分类号 |
H05G2/00;G03F7/20;H01L21/027;H01S3/094;H01S3/227;(IPC1-7):H01L21/027 |
主分类号 |
H05G2/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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