| 摘要 |
PURPOSE:To provide a liquid material supply device which can stably and accurately supply a low vapor pressure liquid material for film formation. CONSTITUTION:In a device for supplying a low vapor pressure liquid material (L) to a film formation processing chamber 30, the low vapor pressure liquid material inside a storage tank 4 is pushed out into a pressurized liquid supply path from a pressurized path 10 by a pressure gas, and the flow rate thereof is controlled in a flow rate control part 6 and at the same time it is supplied to a vaporizer 8 for vaporization, and the vaporized gas is supplied to a film formation processing chamber through a gas supplying path 34 in which a heating means 68 for preventing re-liquefaction is provided. Thereby, a liquid material can be stably and accurately supplied.
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