X-RAY LITHOGRAPHIC METHOD FOR IRRADIATION OF OBJECT AND FOR FORMATION OF PATTERN ON IT

摘要

PURPOSE: To provide a method for reducing the pressure change of a membrane material due to the application of X rays. CONSTITUTION: In an X-ray lithography method for forming a pattern after applying X rays to an object, an X-ray mask 10 with a membrane 18 is used. The membrane 18 has an open membrane surface 26 and X rays 16 are applied to an object 14 through the open membrane surface 26. During the X rays irradiation, the open membrane surface 26 is exposed to the X rays 16 substantially uniformly and only the in the membrane 16 induced by a stress is reduced.