| 摘要 |
PURPOSE:To obtain a focused ion beam apparatus capable of shortening processing time and making processingprecision high by dividing an ion beam into a plurality of ion beams by apertures, and electrode systems. CONSTITUTION:A focused ion beam apparatus emits an ion bean 2 from an ion source 1, and divides the ion beam 2 into two ion beams by causing the ion beam 2 to pass a capacitor lens 3 being a butler lens and an aperture 4. The two ion beams 2 pass an intermediate lens 12 being a butler lens, a deflecting electrode 5 being a first octupole butler (stigmation), a beam blanking aperture 6, an objective lens 7 being butler lens, a deflecting electrode 8 being a second octupole (deflection), and a deflecting electrode 13 capable of applying a deflecting electric field to th ion beams 2, and irradiate a sample 9. |
