发明名称 ELECTRON BEAM IRRADIATION METHOD ELECTRON BEAM GENERATOR AND IMAGE FORMING DEVICE USING THE SAME
摘要 <p>PURPOSE:To stabilize the orbit of electrons emitted from electron emissive elements so as to prevent the electrons from being dislocated from their respective arrival points. CONSTITUTION:An electron source 1 has plural electron emissive elements 15 arranged in the form of a matrix therein, with a spacer 5 of an insulating material functioning as an atmospheric pressure resisting structure in an envelope 10 installed therein. Furtheremore, the electron source 1 has a faceplate 3 wherein a fluorescent screen 7 emitting light by the collision of electrons therewith is formed arranged against the electron emissive elements 15 therein. Out of the respective electron emissive elements 15, ones arranged near and along the spacer 5 are used to emit the electrons to the spacer 5, and charging the spacer 5 with cations generated in the envelope 10 can consequently be neutralized.</p>
申请公布号 JPH087807(A) 申请公布日期 1996.01.12
申请号 JP19940144635 申请日期 1994.06.27
申请人 CANON INC 发明人 SANO YOSHIHISA;MITSUTAKE HIDEAKI;NAKAMURA NAOHITO
分类号 H01J31/12;H01J1/30;H01J1/316;H01J31/15;(IPC1-7):H01J31/12 主分类号 H01J31/12
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