发明名称 Verfahren zur Herstellung von Dünnschicht-Elektrolumineszenz-Elementen
摘要 To improve the manufacture of luminous layers in order to obtain thin-film electroluminescent elements with high luminous brightness, a zinc sulphide ZnS thin film is formed by adding a dopant as an emission centre eg. Mn, argon gas containing hydrogen sulphide is introduced from a gas inlet (13), and a target (8) consisting of zinc and a dopant is sputtered using the argon gas. The temperature of the glass substrate (1) is maintained within the range of 380 to 480 DEG C to cause the vapours of sputtered zinc and dopant, and hydrogen sulphide gas to react with each other, thereby forming a luminous layer on the glass substrate (1). In another arrangement, the zinc target is dotted with terbium fluoride and the luminous layer is subsequently heat-treated at 600 DEG C. Alternatively, other rare earth elements may be used and the sputter gas may by sulphur vapour and argon. <IMAGE>
申请公布号 DE19524359(A1) 申请公布日期 1996.01.11
申请号 DE19951024359 申请日期 1995.07.04
申请人 FUJI ELECTRIC CO., LTD., KAWASAKI, KANAGAWA, JP 发明人 KATO, HISATO, KAWASAKI, JP;KAWASHIMA, TOMOYUKI, KAWASAKI, JP;NAKAMATA, SHINICHI, KAWASAKI, JP;TSUJI, TAKASHI, KAWASAKI, JP;TERAO, YUTAKA, KAWASAKI, JP
分类号 C09K11/57;C09K11/77;C23C14/06;C23C14/34;H05B33/10;H05B33/12;H05B33/14;H05B33/18;(IPC1-7):H05B33/14 主分类号 C09K11/57
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