发明名称 Fluorescent X-ray radiation analysis device
摘要 The device has a source (2) for irradiating a sample (S) containing silicon with a primary X-ray beam (B2) with a wavelength immediately above the Si-K absorption boundary, with a detector (4) for the emitted fluorescent X-ray radiation (B5). The detector is coupled to an analyser (6), for determining the chemical elements contained in the sample, in dependence on the detector output signal. Pref. the source is provided by an X-ray beam generator (5) and a monochromator (10), for providing a monochromatic X-ray beam with removal of the wavelength components within the silicon stimulation wavelength range.
申请公布号 DE19524371(A1) 申请公布日期 1996.01.11
申请号 DE1995124371 申请日期 1995.07.04
申请人 RIGAKU INDUSTRIAL CORP., TAKATSUKI, OSAKA, JP;KABUSHIKI KAISHA TOSHIBA, KAWASAKI, KANAGAWA, JP 发明人 SHOJI, TAKASHI, TAKATSUKI, OSAKA, JP;UTAKA, TADASHI, TAKATSUKI, OSAKA, JP;SHIMAZAKI, AYAKO, KAWASAKI, KANAGAWA, JP;MIYAZAKI, KUNIHIRO, KAWASAKI, KANAGAWA, JP;MATSUMURA, TSUYOSHI, KAWASAKI, KANAGAWA, JP
分类号 G01N23/223;G01N23/225;(IPC1-7):G01N23/223 主分类号 G01N23/223
代理机构 代理人
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