| 摘要 |
A method of projection exposure of a shot area on a substrate to a mask pattern by detecting, by a focus detection mechanism, an amount of defocus, in the axial direction of a projection optical system, of a measuring point on the substrate with reference to the focal plane of the projection optical system, then loading the substrate, and moving the substrate to a predetermined height by a Z-stage movable in the axial direction of the projection optical system, based on the value detected by the focus detection mechanism; thereby exposing a shot area of the substrate to the mask pattern.
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